石墨烯薄膜的光化学还原制备与表征  

Synthesis and Characterization of Graphene Film via Photo-chemical Reduction of Graphene Oxide

作　　者：李冰[1] 高峰[1] 杨光敏[1] 田苗苗[1] 曲雪松[1] 张昕彤[2] 

机构地区：[1]长春师范大学物理学院,长春130032 [2]东北师范大学紫外光发射材料与技术教育部重点实验室,长春130024

出　　处：《高等学校化学学报》2014年第12期2612-2615,共4页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金(批准号:50832001;51072032;11404036);教育部博士学科点专项基金(批准号:20120043110002);长春师范大学自然科学基金(批准号:2014-001);教育部博士后科学基金面上项目(批准号:801141004412);吉林省教育厅'十二五'科学技术研究项目(批准号:2013-257;2013-454)资助~~

摘　　要：采用光化学还原方法制备了图案化的石墨烯薄膜.研究了光还原氧化石墨烯薄膜(PRGO)的热稳定性和发光性质.热重分析(TGA)结果表明,光化学还原主要引起氧化石墨烯(GO)氧化基团的减少,而对GO内水含量影响较小;发光(PL)测试结果表明,不同激发条件下,PRGO的发光与GO相比表现出了不同的变化规律:在波长514 nm的光激发下,PRGO的发光强度比GO明显降低,同时伴随着发光峰峰位红移;而在波长830 nm的光激发下,PRGO的发光强度比GO略有增强,并且发光峰峰位无明显变化,此结果表明不同尺寸的碳团簇局域态(sp2C团簇)的光还原反应活性不同,这与GO特殊的能带结构密切相关.Graphene film pattern was prepared by photo-chemical reduction. The thermal stability and photo-luminescence（ PL） properties of photo-chemical reduction graphene oxide（PRGO） were studied. Thermo-gravimetric analysis（ TGA） results show that the photochemical reduction mainly causes the decrease of oxida-tion groups in the graphene oxide（ GO） sheets, but has little effect on the water content in GO. PL results show that the emission of PRGO is obviously different from those of common-method-made GO when different laser wavelengths are used for excitation. When excited with 514 nm laser, the PL intensity of PRGO was lower than that of GO, accompanied with a red-shift of emission peak. In contrast, when an 830 nm laser is used, the PL intensity of PRGO is slightly higher than that of GO while the PL center positions are similar. The results indicate that the sp2 C clusters with different sizes have different photoreduction activity, which is closely related to the unique band structures of GO.

关 键 词：光化学还原 氧化石墨烯 发光性质 

分 类 号：O644[理学—物理化学]