检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
机构地区:[1]柳州市建益电工材料有限责任公司技术部,广西柳州545005
出 处:《电镀与涂饰》2014年第24期1064-1066,I0002,共4页Electroplating & Finishing
摘 要:镍镀层作为生产电接触元件中铜基体和银复合层之间的过渡层,其可塑性、抗张强度、韧性和延展性均须满足一定的要求。介绍了电接触元件的生产工艺,对适合于电接触元件的镀镍工艺进行了探讨,获得了较好的镀镍工艺条件:NiSO4·7H2O250~350g/L,NiCl2·6H2O25~30g/L,H3BO3 30—40g/L,MgSO4 20—50g/L,(C12H2SO4)Na0.01~0.02g/L,pH3~4,温度40~50℃,电流密度2.0—2.5A/dm^2。该镀镍工艺操作简单,镀液稳定,所得镍镀层光亮平整、延展性好,可以90°折弯而不出现裂纹,成品合格率达98.5%以上。As a transition layer between copper substrate and silver composite coating during the production of electrical contact components, nickel coating's plasticity, tensile strength, toughness, and ductility must meet certain requirements. In this paper, the production process of electrical contact components was introduced and the nickel electroplating process suitable for electrical contact components was studied. Good nickel plating process conditions were obtained in the following: NiSO4·7H2O 250-350 g/L, NiCl2·6H2O 25-30 g/L, H3BO3 30-40 g/L, MgSO4 20-50 g/L, (Cl2H25SO4)Na 0.01-0.02 g/L, pH 3-4, temperature 40-50 ℃, and current density 2.0-2.5 A/dm^2. The nickel plating process is easy to operate and features stable bath. The nickel coating obtained is bright, level, and ductile (being able to be bent to 90° without cracking), with a product pass higher than 98.5%.
分 类 号:TQ153.12[化学工程—电化学工业]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.229