Zn/TiO_2/泡沫镍可见光光电催化氧化水体中As(Ⅲ)  

Photoelectrocatalysis Oxidation of Arsenic(Ⅲ)by Zn/TiO_2/Nickel Foam Compound Photocatalyst under Visible Light Irradiation

作　　者：任超艳 魏志钢[1] 潘湛昌[1] 谢英豪[1] 杜欣欣[1] 

机构地区：[1]广东工业大学轻工化工学院,广东广州510006

出　　处：《安全与环境工程》2014年第6期60-64,共5页Safety and Environmental Engineering

基　　金：国家自然科学基金项目(20803014);广东省自然科学基金项目(10251009001000003)

摘　　要：采用阴极电沉积法在泡沫镍上负载Zn掺杂TiO2,制得Zn/TiO2/泡沫镍光催化剂,利用X射线衍射仪(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)等对其进行了晶体结构、表观形貌、表面元素状态的分析,并研究了Zn/TiO2/泡沫镍在可见光照射和负偏压作用下光电催化氧化水体中As(Ⅲ)的反应性能。试验结果表明:Zn成功以替代的形式进入TiO2晶体内,Zn/TiO2/泡沫镍在可见光照射和最佳偏压-0.4V作用下,光电催化氧化As(Ⅲ)的反应速率为TiO2/泡沫镍的1.5倍以上;当Zn2+掺杂量为0.52%,初始As(Ⅲ)浓度为1.0mg/L,pH值为7±0.05,光照3h,施加-0.4V偏压时,As(Ⅲ)的去除率高达92.6%,此时氧化As(Ⅲ)的主要物质为超氧自由基,超氧自由基在光照作用下进一步转化成羟基自由基氧化As(Ⅲ);负偏压同时起阴极保护作用,避免引起基材金属镍溶出,可应用于处理饮用水。This paper applies cathodic electrodeposition method to preparing Zn/TiO2/nickel foam and applies XRD,SEM,and XPS to analyzing its crystal structure,superficial appearance and surface elements state,and then studies the reaction performance of photoelectrocatalysis oxidation of arsenic（III）by Zn/TiO2/nickel foam compound photocatalyst under visible light irradiation.The result shows that Zn enters into the TiO2 crystal with alternative forms.Catalytic reaction rate for As（Ⅲ）by Zn/TiO2/nickel foam is over 1.5times higher than by TiO2/nickel foam under visible light irradiation and the optimal bias-0.4V.As（Ⅲ）removal rate is up to 92.6% when Zn2＋doping amount is 0.52%,the initial concentration of As（Ⅲ）is 1.0mg/L,bias voltage is-0.4V,pH is 7±0.05 and under visible light irradiation is 3h.At the moment,the superoxide radical is the main material for oxidation As（Ⅲ）,and the superoxide radical further converts into hydroxyl radical oxidation As（Ⅲ）under irradiation.This method can be applied to treating drinking water and negative bias also plays a cathodic protection role to avoid the dissolution of nickel metal substrate.

关 键 词：砷污染 Zn/TiO2/泡沫镍 光电催化氧化 可见光 负偏压 

分 类 号：X52[环境科学与工程—环境工程]