激光诱导薄膜损伤的光偏转特性研究  

Study on Photo Deflection Characteristics of Thin Film on Laser Induced Damage

作　　者：杨利红[1] 韩锦涛[1] 苏俊宏[1] 

机构地区：[1]西安工业大学光电工程学院,西安710021

出　　处：《西安工业大学学报》2014年第10期789-794,共6页Journal of Xi’an Technological University

基　　金：国家自然科学基金资助项目(61378050);国家国际科学合作专项(2013DFR70620);陕西省教育厅资助项目(12JK0996)

摘　　要：为了提高测定光学薄膜的损伤阈值的准确性.文中基于光偏转法识别薄膜损伤的模型,搭建了反射式光偏转实验测试系统,采用1-on-1法对SiO2薄膜进行了损伤测试.研究结果表明:像元尺寸为4μm×4μm,光斑接收屏到辐照点的距离为3 264.6mm,SiO2薄膜辐照点的最小斜率变化量为1.23×10-6.当泵浦光束能量密度小于等于SiO2薄膜的损伤阈值15J·cm-2时,探测光斑的光强分布发生变化;当泵浦光能量密度大于薄膜损伤阈值15J·cm-2时,探测光斑大小和样子发生改变.In order to improve the accuracy of LIDT determination, photo-deflection experimental test system of reflective type was established based on model of photo-deflection method to identify film damage,SiO2 film damage experiment was conducted using 1-on-1 method. The results show： While pixel size is 4 μm×4μm, distance between receiving screen and irradiated point is 3 264.6 mm, the minimum amount of change in the slope of SiO2 film on irradiation point is 1. 23 × 10^-6. When the pump beam energy density is less than or equal to SiO2 LIDT 15 J·cm^-2 ,intensity distribution of probe spot changes While pump beam energy density is bigger than SiO2 LIDT 15 J·cm^-2, size and appearance of detection spot change.

关 键 词：光偏转 SIO2薄膜 损伤形貌 激光损伤 

分 类 号：O484.41[理学—固体物理]