真空紫外激光辐照对熔石英表面氧空位的影响  

Oxygen-Deficiency of Fused Silica Surfaces Induced by Ultra Violet Pulsed Laser Irradiation in High Vacuum

作　　者：黄进[1] 周信达[1] 周晓燕[1] 耿峰[1] 刘红婕[1] 王凤蕊[1] 孙来喜[1] 叶鑫[1] 吴卫东[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,绵阳621900

出　　处：《真空科学与技术学报》2014年第12期1393-1398,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然基金资助课题(61078075)

摘　　要：在真空环境下利用紫外脉冲激光对熔石英元件表面进行了低于损伤阈值的辐照,通过X射线光电子能谱对激光诱导的表面氧空位进行了精细表征。研究结果表明:在10-3Pa的高真空环境下熔石英表面易受紫外激光激励形成低结合能的O1s(531 e V),这种非稳定结构在后续紫外脉冲激光辐照下会出现Si-O键断裂从而产生氧空位,氧空位产生的程度取决于激光脉冲能量、发次以及真空度,且对熔石英元件的抗损伤性能有显著的负面影响。The surfaces of fused silica, widely used as ultra violet（UV）laser transmission material, were irradiated by a 355 nm pulsed laser with an energy below the damage threshold at 10- 3 Pa to investigate the mechanism responsible for formation of surface oxygen-deficiency centers（ODC）. The influence of the irradiation conditions, including but not limited to the laser energy, pulse number, and pressure, on ODC formation were characterized with X-ray photoelectron spectroscopy. The preliminary results show that the UV irradiation easily induces ODC formation, resulting in serious reduction of damage-resistance. The Ols （531 eV）meta-stable state of Si-O bond, possibly formed by excitation of the first UV laser pulse, breaks easily by irradiation of the subsequent UV laser pulses, leading to emergence of oxygen deficiency centers. We found that the laser energy,pulse number,and pressure all have a major impact on the ODC density.

关 键 词：紫外脉冲激光 X射线光电子能谱 熔石英 损伤阈值 氧空位 

分 类 号：TB321[一般工业技术—材料科学与工程]