Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity  

作　　者：王子文 蔡家琦 吴以治 王会杰 许小亮 

机构地区：[1]Department of Physics, University of Science and Technology of China

出　　处：《Chinese Physics B》2015年第1期507-510,共4页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation of China(Grant No.51272246);the Scientific and Technological Research Foundation of Anhui Province,China(Grant No.12010202035)

摘　　要：Highly ordered silicon nanorod（Si NR） arrays with controllable geometry are fabricated via nanosphere lithography and metal-assisted chemical etching. It is demonstrated that the key to achieving a high-quality metal mask is to construct a non-close-packed template that can be removed with negligible damage to the mask. Hydrophobicity of Si NR arrays of different geometries is also studied. It is shown that the nanorod structures are effectively quasi-hydrophobic with a contact angle as high as 142°, which would be useful in self-cleaning nanorod-based device applications.Highly ordered silicon nanorod（Si NR） arrays with controllable geometry are fabricated via nanosphere lithography and metal-assisted chemical etching. It is demonstrated that the key to achieving a high-quality metal mask is to construct a non-close-packed template that can be removed with negligible damage to the mask. Hydrophobicity of Si NR arrays of different geometries is also studied. It is shown that the nanorod structures are effectively quasi-hydrophobic with a contact angle as high as 142°, which would be useful in self-cleaning nanorod-based device applications.

关 键 词：silicon nanorod array HYDROPHOBICITY SELF-CLEANING metal-assisted chemical etching 

分 类 号：TB383.1[一般工业技术—材料科学与工程]