基于8-11μm红外窗口系统中减反射与保护膜的研制  

Design and preparation of anti-reflection and protective film in 8-11 μm infrared detection system

作　　者：付秀华[1] 杨金也 刘冬梅[1] 张静[1] 寇洋[1] 

机构地区：[1]长春理工大学光电工程学院,吉林长春130022

出　　处：《红外与激光工程》2014年第12期3889-3893,共5页Infrared and Laser Engineering

摘　　要：随着现代军事空间技术的快速发展,对红外探测器的要求越来越高。同时,对红外光学元件的要求也越来越苛刻。主要研究了硫化锌(Zn S)基底表面减反与保护膜的制备技术,采用介质膜与硬膜复合方法,通过对不同材料的对比分析,最终选取碳化锗(Ge1-xCx)材料作为介质膜与DLC类金刚石保护膜的过渡层。利用电子束与离子源辅助沉积技术制备介质膜;磁控溅射技术制备过渡层碳化锗;化学气相沉积技术制备DLC类金刚石保护膜,解决了介质膜与类金刚石保护膜应力匹配的问题,并通过对多种沉积工艺的整合,得到了一套稳定的工艺制备流程。最终在硫化锌基底上制备出的减反射与保护膜平均透过率达到92%,硬度符合要求。With the rapid development of modern military space technology,the requirement of infrared detector is increasing,the requirement of infrared optical element will stricter at the same time.The preparation of anti-reflection and protective film on the substrate of Zn S were mainly studied.The coating method of dielectric and hard film were combined,through the comparative analysis of different materials,finally,the carbide germanium（Ge1-xCx） as transition layer which between media film and DLC would be selectted.Using electron beam and ion source assisted deposition technology to manufacture the dielectric film,and using magnetron sputtering technology to manufacture the transition layer,at the end of process the DLC will be prepared by chemical vapor deposition technique.The problems of stress matching,and integrate different sedimentary processes were solved,meanwhile a stable process preparation process was got.Finally,the anti-reflection and protective film were deposited which average transmitted is 92%,the hardness meets the requirements.

关 键 词：薄膜 减反膜 类金刚石保护膜 工艺衔接 

分 类 号：O484[理学—固体物理]