磁控溅射沉积ZnNi合金薄膜及真空脱锌  

Magnetron sputtering deposition and vacuum dezincification of zinc-nickel alloy thin films

作　　者：徐前刚[1] 李明佳[1] 

机构地区：[1]沈阳航空航天大学材料科学与工程学院,沈阳110136

出　　处：《沈阳航空航天大学学报》2015年第1期50-54,共5页Journal of Shenyang Aerospace University

基　　金：国家自然科学基金(项目编号:50704001)

摘　　要：采用射频磁控溅射沉积方法制备了不同成分的ZnNi合金薄膜,并研究了真空热处理对其成分及表面形貌的影响。研究结果表明,在单靶溅射沉积ZnNi合金薄膜中,通过调节靶材锌镍面积比可以获得不同成分且分布均匀的ZnNi薄膜。经过600℃、60 min、真空度为4×10-3Pa,真空热处理之后的薄膜中的锌完全蒸发,剩下的镍薄膜呈多孔结构,微孔尺寸在100 nm至500 nm之间。随着薄膜锌含量的增加,真空热处理后薄膜表面孔隙率增大。随着真空热处理温度的升高,微孔尺寸增大。结合溅射沉积理论及元素蒸发理论对ZnNi薄膜沉积及真空脱Zn进行了分析。The zinc-nickel alloy thin films with different zinc contents were prepared by means of radio frequency magnetron sputtering deposition. The effect of vacuum heat treatment on the content and surface morphology of alloy films has been studied. The results showed that it was feasible to deposit ZnNi thin films with different Zn contents by changing the area ratio of zinc and nickel in the mosaic target. The zinc contained in the alloy films has evaporated completely after vacuum heat treatment （4×10^-3 Pa, 60 min） at 600 ℃. After dezincification, micro-pores with the size of 100nm to 500nm were formed in the thin films. The porosity increased with the zinc contents of thin film after vacuum heat treatment. With the increase in the temperature of vacuum heat treatment, the size of micro-pores in the film in- creased. The deposition and dezincification in vacuum of ZnNi thin film were analyzed combined with the theory of elements evaporation and sputtering deposition.

关 键 词：脱锌 ZnNi合金薄膜 真空热处理 多孔结构 

分 类 号：TB31[一般工业技术—材料科学与工程] V261.2[航空宇航科学与技术—航空宇航制造工程]