Zn/TiO_2/泡沫镍可见光下光催化氧化水体中As(Ⅲ)  

Photocatalystic oxidation of arsenic(Ⅲ) in water by Zn/TiO_2/nickel foam photocatalystic oxidation under visible light irradiation

作　　者：任超艳 魏志钢[1] 潘湛昌[1] 谢英豪 杜欣欣[1] 

机构地区：[1]广东工业大学轻工化工学院,广东广州510006 [2]广东邦普循环科技有限公司,广东佛山528244

出　　处：《工业水处理》2015年第1期52-55,共4页Industrial Water Treatment

基　　金：国家自然科学基金项目(20803014);广东省自然科学基金项目(10251009001000003)

摘　　要：采用阴极电沉积法在泡沫镍上负载Zn2+掺杂TiO2,制得Zn/TiO2/泡沫镍光催化剂,利用XRD、SEM、UVVis、CA对其进行了晶体结构、表观形貌、光学及光电特性的分析,并研究了可见光催化氧化As(Ⅲ)的反应性能。结果表明,掺杂Zn2+将TiO2禁带宽度减少0.05 e V,使起始吸收带边红移。Zn/TiO2/泡沫镍光电流密度为非掺杂的5倍。Zn/TiO2/泡沫镍可见光催化氧化As(Ⅲ)的去除率为非掺杂的1.8倍,羟基自由基在光催化过程中起重要作用。光催化后溶液未检测到镍基材溶出,可应用于处理饮用水。Zn/TiO2/nickel foam photo-catalyst has been prepared by cathodically electrochemical deposition method on nickel foam loading Zn^2＋-doped TiO2. Its crystal structure,superficial appearance,optical and photoelectric proper-ties have been analyzed by XRD,SEM,UV-Vis and CA. Then,the reactivity worth of visible light catalytic oxidation of As（Ⅲ） has been studied. The results show that the optical absorption edge of the Zn^2＋-doped TiO2 appears shifted towards the longer wavelength side and the band gap decreases by 0.05 eV. In addition ,light current density of Zn/TiO2/nickel foam shows 5 times higher than that of TiO2/nickel foam under visible light irradiation. As（Ⅲ） removing rate of Zn/TiO2/nickel foam is 1.8 times higher than that of TiO2/nickel foam under visible light irradiation. The hydroxyl free radicals play an important role in the photocatalytic process. Nickel substrate dissolution has not been detected in solution after photocatalysis. Therefore,Zn/TiO2/nickel foam is quite suitable for the application to the treatment of drinking water.

关 键 词：阴极电沉积 二氧化钛 光催化 砷 泡沫镍 

分 类 号：X703.1[环境科学与工程—环境工程]