电子束蒸发TiO_2膜通氧量对薄膜光学性能的影响  

EFFECT OF THE OXYGEN FLUX ON OPTICAL PROPERTIES OF Ti O_2 FILMS GROWING BY ELECTRON-BEAM EVAPORATION

作　　者：王超[1] 王多书[1] 王济洲[1] 李坤[1] 李晨[1] 高欢[1] 

机构地区：[1]兰州空间技术物理研究所真空技术与物理重点实验室,兰州730000

出　　处：《真空与低温》2015年第1期11-14,共4页Vacuum and Cryogenics

摘　　要：研究了不同通氧量对电子束蒸发沉积二氧化钛薄膜的光学性能影响.随着氧气流量从37.4×10^-3 Pa·m^3·s^-1增加到61.2×10^-3 Pa·m^3·s^-1,真空室的真空度从1.4×10^-3 Pa 变化到2.5×10^-3 Pa,可以得到不同光学性能的二氧化钛薄膜.采用分光光度计测试其光谱,结果发现TiO2薄膜的透射率峰值随着真空度降低而增大,折射率和消光系数随真空度降低先升高后降低.在真空度2.0×10^-3 Pa 的工艺条件下,成膜质量最优,透射率为92%,折射率在2.50～2.20 之间,消光系数在10^-4以下.根据Cauchy 方程拟合其色散规律,拟合曲线和采用包络法计算得到的曲线较好重合,折射率随波长的变化公式为n（λ）=2.17＋6.12×10^4/λ^2＋2.98×10^8/λ^4.The optical properties of TiO2 thin film deposited by electron beam evaporation with different oxygen fluxwere studied. When the oxygen flux from 37.4×10^-3 Pa·m^3 ·s^-1 to 61.2×10^-3 Pa·m^3 ·s^-1,vacuum degree was rising from1.4×10^-3 Pa to 2.5×10^-3 Pa,the different optical properties will gain from TiO2 thin film. Spectrophotometer was used totest spectrum,when the vacuum degree decreased,it was found that peak value transmittance of TiO2 has increased. Therefractive index and extinction coefficient increased first and then decreased. Under vacuum degree of 2.0×10^-3 Pa ,the bestTiO2 thin film quality,the peak value transmittance was 92%,the refractive index changed from 2.50 to 2.20. The extinctioncoefficient was below 10^-4. By-use Cauchy chromatic dispersion formula. The fitting curve accorded well with the resultby the envelope method. Refractive index changing with the wavelength formula is n（λ）=2.17＋6.12×10^4/λ^2＋2.98×10^8/λ^4.

关 键 词：薄膜 TIO2 通氧量 真空度 光学性能 

分 类 号：O484.41[理学—固体物理]