温度对O_3及O_3/H_2O_2工艺去除痕量阿特拉津的影响  

Effect of Temperature on Removal of Trace Atrazine by O_3 and O_3/ H_2O_2 Processes

作　　者：刘永泽[1] 江进[1] 马军[1] 罗从伟[1] 皇甫小留[1] 郭忠凯[1] 

机构地区：[1]哈尔滨工业大学城市水资源与水环境国家重点实验室,黑龙江哈尔滨150090

出　　处：《中国给水排水》2015年第5期54-57,共4页China Water & Wastewater

基　　金：国家"十二五"科技支撑计划项目(2012BAC05B02);城市水资源与水环境国家重点实验室(哈尔滨工业大学)自主课题(2013TS04;2015DX05);全国优秀博士学位论文作者专项资金资助项目(201346)

摘　　要：研究了O3及O3/H2O2工艺在低温和常温条件下对实际水体中痕量阿特拉津的去除规律。结果表明:低温(5℃)条件下,O3分解相当缓慢,单独O3氧化工艺对阿特拉津的去除能力有限,而O3/H2O2工艺优势明显;常温(25℃)条件下,O3分解较快,单独O3氧化工艺就能有效降解阿特拉津,O3/H2O2工艺优势较弱。理论分析认为,O3完全分解条件下产生的羟基自由基的CT值与O3投量相关,而与H2O2投量无关。因此,H2O2投量应使O3在氧化接触时间内恰好完全分解为最佳,可以用剩余臭氧浓度作为指示参数来控制H2O2的投加。The removal of trace atrazine from the real water by O3 and O3/H2O2 processes at low temperature and room temperature was investigated. The results indicated that： At low temperature （5℃）, the decomposition of O3 was quite slow, and the removal of atrazine by the O3 process was limited, while the O3/H2O2 process was of great advantage to atrazine removal. At room temperature （25℃）, the decomposition of O3 was quick, and the O3 process could effectively remove atrazine, while the O3/ H2O2 process was of little advantage to atrazine removal. The theoretical analysis suggested that the CT values of · OH radical in the O3 and O3/H2O2 processes were correlated to O3 dosage and not to H202 dosage. The optimal dosage of H2O2 in the OJH2O2 process was to guarantee an exactly complete decomposition of O3 within the reaction time, and the residual O3 concentration could be used as the indicator to control the H2O2 dosage.

关 键 词：O3 O3/H2O2工艺 低温 常温 阿特拉津 

分 类 号：TU991.2[建筑科学—市政工程]