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作 者:LU GuangYi WANG Yuan ZHANG LiZhong CAO Jian JIA Song ZHANG Xing
机构地区:[1]Institute of Microelectronics, Peking University [2]Innovation Center for Micro/Nanoelectronics and Integrated System
出 处:《Science China(Information Sciences)》2015年第4期130-138,共9页中国科学(信息科学)(英文版)
基 金:supported by National Basic Research Program of China (973 Program) (Grant No. 2011CBA00606);Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 61106101)
摘 要:Gate-grounded NMOS (ggNMOS) transistors have widely served as electro-static discharge (ESD) protection devices for integrated circuits. The layout strategy of ggNMOS greatly influences its ESD protection characteristics. Layout strategies forvariation of the number of substrate-pickup stripes are investigated in this paper. Direct current and transmission-line pulsing test results are presented to verify that adjustable holding voltages are accessed by variation of the number of substrate-pickup stripes. The design with two evenly distributed substrate-pickup stripes among different fingers is found to exhibit the highest second break current and optimal width-scaling characteristics.Gate-grounded NMOS (ggNMOS) transistors have widely served as electro-static discharge (ESD) protection devices for integrated circuits. The layout strategy of ggNMOS greatly influences its ESD protection characteristics. Layout strategies forvariation of the number of substrate-pickup stripes are investigated in this paper. Direct current and transmission-line pulsing test results are presented to verify that adjustable holding voltages are accessed by variation of the number of substrate-pickup stripes. The design with two evenly distributed substrate-pickup stripes among different fingers is found to exhibit the highest second break current and optimal width-scaling characteristics.
关 键 词:gate-grounded NMOS (ggNMOS) electro-static discharge (ESD) triggering voltage holding voltage second breakdown current
分 类 号:TN386[电子电信—物理电子学]
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