检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:许伟[1,2] 胡芳[1,2] 代明江[1,2] 陈梓赫 林松盛[1,2] 侯惠君[1,2]
机构地区:[1]广东省工业技术研究院 [2]广州有色金属研究院新材料研究所,广东广州510651
出 处:《电镀与涂饰》2015年第3期125-129,共5页Electroplating & Finishing
基 金:国家科技支撑计划(2012BAE02B01)
摘 要:采用直流磁控溅射技术在烧结型Nd Fe B永磁体表面沉积Al薄膜,研究了喷丸和铬酸盐化学转化后处理方法对Al薄膜微观形貌和耐腐蚀性能的影响。研究表明,喷丸可以有效地减少铝薄膜的孔隙率,提高膜层的致密性;喷丸压力为0.20 MPa时,Al膜层的致密性最好且不会剥落;喷丸和化学转化复合后处理可以极大程度地提高Al薄膜的耐蚀性,其耐中性盐雾腐蚀时间可由镀态时的155 h提高到320 h。Aluminum film was deposited on the surface of sintered NdFeB permanent magnet by direct current magnetron sputtering. The influence of post-treatment including shot blasting and chemical conversion on micro-morphology and corrosion resistance of A1 film were studied. The results indicated that shot blasting can effectively decrease the porosity orAl film and increase its compactness. The A1 film treated by shot lasting at a pressure of 0.2 MPa has the best compactness and will not peel off. The resistance of the A1 film to neutral salt spray corrosion is significantly improved from 155 h as plated to 320 h by the combination of shot blasting and chemical conversion.
关 键 词:钕铁硼永磁体 铝薄膜 磁控溅射 喷丸 铬酸盐化学转化 耐蚀性
分 类 号:TG174.444[金属学及工艺—金属表面处理]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.1