热处理温度对ZrO_2薄膜表面形貌和结构的影响  

Influences of the Annealing Temperature on the Surface Morphology and Structure of ZrO_2 Thin Films

作　　者：冀国俊[1] 张薇[1] 张智慧[1] 

机构地区：[1]内蒙古工业大学化工学院,呼和浩特010051

出　　处：《微纳电子技术》2015年第3期173-177,184,共6页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(11462017);内蒙古自治区自然科学基金资助项目(2014BS0104)

摘　　要：采用溶胶-凝胶法,在302不锈钢表面制备了经不同温度热处理的ZrO2薄膜。通过原子力显微镜(AFM)、X射线衍射仪(XRD)和傅里叶变换红外光谱仪(FTIR),研究了热处理温度对ZrO2薄膜表面形貌和相结构的影响。研究结果表明:室温下ZrO2结构呈非晶态,随着温度升高,晶体结构逐渐由四方相(t-ZrO2)向单斜相(m-ZrO2)转变;当热处理温度从400℃升高到600℃时,薄膜表面ZrO2晶粒尺寸由40 nm逐渐增大到70.1 nm,表面粗糙度也由3.34 nm缓慢增大到5.3 nm;而当热处理温度为700℃时,ZrO2晶粒明显增大(109 nm),表面粗糙度迅速增大到33 nm;红外吸收谱显示,随着热处理温度的升高,非晶态ZrO2(648与460.9 cm-1)逐渐向480.2和574.7 cm-1处的t-ZrO2结构以及424.3和732.8 cm-1处的m-ZrO2结构转变,与XRD结果一致。The ZrO2 thin films annealed at different temperatures were prepared on the surface of the 302 stainless steel substrates by the sol-gel method.The influences of the annealing temperature on the surface morphology and phase structure of ZrO2 thin films were researched by atomic force microscopy（AFM）,X-ray diffractometer（XRD）and Fourier transform infrared spectroscopy（FTIR）.The results indicate that the ZrO2 films present amorphous structure at room temperature,and then the crystal structure of ZrO2 transforms from tetragonal phase（t-ZrO2）to monoclinic phase（m-ZrO2）with the increase of the temperature.When the annealing temperature increases from400 ℃ to 600 ℃,the grain sizes of ZrO2 thin films increase from40 nm to70.1 nm and the surface roughness slowly increases from3.34 nm to 5.3 nm.When the annealing temperature is 700 ℃,the ZrO2 grain sizes increase significantly（109 nm）and the surface roughness rapidly increases to 33 nm.The FTIR results show that the amorphous ZrO2（648 and460.9 cm-1）gradually transforms to t-ZrO2（480.2 and 574.7 cm-1）and m-ZrO2（424.3 and732.8 cm-1）with the increase of the annealing temperature,which are consistent with the results of XRD.

关 键 词：ZRO2薄膜 溶胶-凝胶 热处理 表面形貌 晶体结构 

分 类 号：O484.5[理学—固体物理]