化学法去除碳化钨–钴涂层的工艺  

Removal of tungsten carbide–cobalt coating by chemical method

作　　者：李晗晔[1] 冮冶 刘志强[1] 

机构地区：[1]中航工业沈阳黎明航空发动机(集团)有限责任公司技术中心,辽宁沈阳110043

出　　处：《电镀与涂饰》2015年第5期269-271,共3页Electroplating & Finishing

摘　　要：采用化学法分别去除GH4169合金及TC4合金基材表面的WC–Co等离子喷涂层。通过正交试验对去除液配方和处理温度进行优化。GH4169基WC–Co涂层的最优去除工艺条件为:HNO3 30 m L/L,H2O2 550 m L/L,处理温度35°C。TC4合金基WC–Co涂层的最优去除工艺条件为:HNO3 70 m L/L,H2O2 550 m L/L,处理温度30°C。采用上述工艺可有效去除GH4169和TC4表面的WC–Co涂层,对基体无明显的化学腐蚀,不会导致基体吸氢。1 L去除液可处理约10 dm2 0.3 mm厚的WC–Co涂层。The plasma sprayed WC-Co coatings on surface of GH4619 and TC4 alloys were removed by chemical method. The removal bath composition and treatment temperature were optimized through orthogonal test. The optimal process conditions are HNO3 30 mL/L, H202 550 mL/L, and treatment temperature 35 ℃ for removing WC-Co coating from GH4619 alloy substrate, and HNO3 70 mL/L, H2O2 550 mL/L, and treatment temperature 30 ℃ for TC4 substrate. The WC-Co coatings on the surfaces of both GH4169 and TC4 can be removed effectively by using the given processes. There is no obvious chemical corosion and hydrogen absorption phenomena on the substrates during removal processing. 1 L removal solution can be used to treat about 1 dm2 of 0.3 mm-thick WC-Co coating.

关 键 词：钛 高温合金 碳化钨 钴 等离子喷涂层 去除 

分 类 号：TG174.36[金属学及工艺—金属表面处理]