Diffractive self-imaging based on selective etching of a ferroelectric domain inversion grating  

作　　者：陈云琳 范天伟 曼佟 

机构地区：[1]Institute of Applied Micro-Nano Materials, School of Science, Beijing Jiaotong University

出　　处：《Chinese Optics Letters》2015年第2期9-12,共4页中国光学快报（英文版）

基　　金：supported by the National Natural Science Foundation of China(No.61178052);the Ph.D. Programs Foundation of the Ministry of Education of China(No.20130009110008)

摘　　要：A hexagonal array grating based on selective etching of a 2D ferroelectric domain inversion in a periodically poled Mg O-doped Li Nb O3 crystal is fabricated. The effects to the diffractive self-imaging as a function of diffraction distance for a fixed phase difference and array duty cycle of the grating is theoretically analyzed.The Talbot diffractive self-imaging properties after selective etching of a 2D ferroelectric domain inversion grating under a fixed phase difference are experimentally demonstrated. A good agreement between theoretical and experimental results is observed.A hexagonal array grating based on selective etching of a 2D ferroelectric domain inversion in a periodically poled Mg O-doped Li Nb O3 crystal is fabricated. The effects to the diffractive self-imaging as a function of diffraction distance for a fixed phase difference and array duty cycle of the grating is theoretically analyzed.The Talbot diffractive self-imaging properties after selective etching of a 2D ferroelectric domain inversion grating under a fixed phase difference are experimentally demonstrated. A good agreement between theoretical and experimental results is observed.

关 键 词：Diffraction gratings ETCHING Ferroelectric materials 

分 类 号：O436.1[机械工程—光学工程]