真空退火对多弧离子镀Ti-Al-N涂层的影响  

Influence of Vacuum Annealing on Multi Arc Ion Plated Ti-Al-N Coatings

作　　者：刘佳磊[1] 王蕾[1] 张学宇[1] 金松哲[1] 

机构地区：[1]长春工业大学先进结构材料省部共建教育部重点试验室,吉林长春130012

出　　处：《热加工工艺》2015年第4期165-167,170,共4页Hot Working Technology

基　　金：吉林省科技厅资助项目(20070511)

摘　　要：采用多弧离子镀技术和后续的真空退火工艺在06Cr19Ni10不锈钢基体上制备了Ti2AlN涂层;研究了多弧离子镀工艺及退火处理对涂层的成分、相组成以及摩擦系数等性能的影响。结果表明,沉积时氮气通量以及退火温度的选择是Ti2AlN相形成的关键因素,在氮气通量40 nm3/h、负偏压400 V、靶电流75 A、占空比90%的条件下镀制的涂层经700℃真空退火获得了纯度较高的Ti2AlN涂层,其硬度为7.2 GPa,摩擦系数仅为0.18。Ti2AlN coating was prepared on 06Cr19Ni10 stainless steel substrate by multi arc ion plating technique and vacuum annealing process. The influences of multi arc ion plating technique and vacuum annealing on composition, phase and friction coefficient of the coatings were studied. The results show that the key factors influencing Ti2 Al N phase formation are N2 fluxes and annealing temperature. High content Ti2 AlN coating is obtained by the N2 fluxes of 40 nm3/h, the negative bias of 400 V, the target current of 75 A and 90% duty cycle after vacuam annealing at 700 ℃, the hardness is 7.2 GPa and the friction coefficient is 0.18.

关 键 词：多弧离子镀 真空退火 Ti2AlN涂层 

分 类 号：TG148[一般工业技术—材料科学与工程] TG156.25[金属学及工艺—金属材料]