Influence of Working Pressure on Ion Sensitive Probe Measurement in Microwave ECR Plasmas  

作　　者：马志斌 吴俊 谭必松 沈武林 潘鑫 汪建华 

机构地区：[1]Province Key Laboratory of Plasma Chemistry and Advanced Materials,School of Materials Science and Engineering,Wuhan Institute of Technology

出　　处：《Plasma Science and Technology》2015年第4期294-297,共4页等离子体科学和技术（英文版）

基　　金：supported by National Natural Science Foundation of China(No.10875093)

摘　　要：In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investigated at different working pressures of 0.03 Pa and 0.8 Pa.Results show that the I-V curves at higher pressure are more sensitive to the variation of h than those at lower pressure.The influence of V_B on ion temperature（T_i）measurement becomes more prominent when the pressure is increased from 0.03 Pa to 0.8 Pa.Under both pressures,the optimized h is obtained at the condition where the current reaches zero in the positive voltage region with a suitable V_B of-1.5 V because of effective shielding of the electron E×B drift.In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investigated at different working pressures of 0.03 Pa and 0.8 Pa.Results show that the I-V curves at higher pressure are more sensitive to the variation of h than those at lower pressure.The influence of V_B on ion temperature（T_i）measurement becomes more prominent when the pressure is increased from 0.03 Pa to 0.8 Pa.Under both pressures,the optimized h is obtained at the condition where the current reaches zero in the positive voltage region with a suitable V_B of-1.5 V because of effective shielding of the electron E×B drift.

关 键 词：working pressure ion sensitive probe ion temperature plasma 

分 类 号：O53[理学—等离子体物理]