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作 者:肖忠良[1] 高洁[1] 宋刘斌[1] 吴道新[1] 朱梦[1]
机构地区:[1]长沙理工大学化学与生物工程学院,湖南长沙410004
出 处:《长沙理工大学学报(自然科学版)》2015年第1期97-101,共5页Journal of Changsha University of Science and Technology:Natural Science
基 金:国家科技支撑计划项目(2012BAD31B08;2012BAC17B01);国家自然科学基金资助项目(21275022;21075011);湖南省科技计划项目(2014FJ3159;2014GK3119)
摘 要:分别运用X射线荧光测厚和SEM,研究了Pd浓度、NH3·H2O浓度、EDTA浓度、pH值及时间对印刷电路板置换镀钯的影响。实验结果表明,当CPd2+浓度在0.5~0.8g/L范围内,钯的沉积厚度随钯离子浓度的增加而增加;当CPd2+浓度大于0.8g/L时,钯的沉积厚度基本不变;Pd的沉积厚度随着所加入的NH3·H2O的量的增多而先增大后减小;EDTA能提高镀钯液的稳定性,Pd的沉积厚度随着EDTA浓度的增加而降低;当pH=(5.0±0.2)时,Pd的沉积厚度达到最大;镀钯速率随施镀时间的增加而下降。SEM的结果表明,在40℃时所得钯层致密、厚度均匀。The effects of Pd concentration,NH3·H2O concentration,EDTA concentration,pH and immersion time on chemical immersion palladium process on printed circuit board by using X-ray fluorescence for thickness measuring and SEM were investigated.The results showed that when the Pd ion concentration was from 0.5g/L to 0.8g/L,the Pd deposition thickness increased with the increasing of the Pd ion concentration;when the Pd ion concentration was greater than 0.8g/L,the Pd deposition thickness was almost the same.The sedimentary thickness of the Pd with the joining of NH3·H2O quantity first increase then decrease;EDTA can improve the stability of the palladium plating liquid and the sedimentary thickness of the Pd decreased with the increase of the EDTA;when pH=5.0±0.2,the Pd deposition thickness reached the maximum.The plating speed decreased with the increasing plating time.The characterization results of SEM indicated that the Pd coating was compact and uniform at 40 ℃.
分 类 号:TQ153.19[化学工程—电化学工业]
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