光学薄膜参数测量方法研究  

Study on optical thin film parameters measurement method

作　　者：李凯朋 王多书[1] 李晨[1] 王济州[1] 董茂进[1] 张玲[1] 

机构地区：[1]兰州空间技术物理研究所表面工程技术重点实验室,甘肃兰州730000

出　　处：《红外与激光工程》2015年第3期1048-1052,共5页Infrared and Laser Engineering

摘　　要：为了研究准确性和效率更高的膜层光学薄膜参数测量方法,对优化膜系结构和改进制备工艺都有重要的指导作用。论文在研究传统测量方法基础上,将包络线法与全光谱拟合反演法相结合,提出了一种新型的光学薄膜参数测量方法。该方法将采用包络线法计算的单层膜光学薄膜参数近似值作为参考,设置全光谱拟合反演法优化搜索的上下限,结合适当的评价函数构建计算物理模型,并选用综合优化算法求解获得待测膜系各膜层的光学薄膜参数。最后设计Ti O2、Si O2单层膜和膜系为:G|0.5HLHL0.5H|A(H-Ti O2,L-Si O2)的多层膜进行测量验证,并分析了该测量方法的效率、准确度、稳定性等。Studying more precise and efficient measuring-method for determining optical parameters of thin films plays a guiding role in improving design and optimizing preparation process of optical thin films. Several traditional measuring-methods were introduced briefly in this paper, and a new measuring-method was deduced combined envelope with the full spectrum inversion method fitting. In this method,optical parameters of a single layer were calculated approximately with envelope method, and according to the results, the upper and lower limits of the optical parameters were estimated for the full spectrum inversion method fitting firstly. Then, the physical model of the new method was established. After that,the optical parameters of thin films were solved by choosing a comprehensive optimization algorithm.Finally, the validity of the new method was validated through measuring of Ti O2、Si O2single-layer and G ｜ 0.5HLHL0.5H ｜A（H-Ti O2,L-Si O2） multilayer. Besides, the measurement accuracy, efficiency and stability of the new method were also analyzed.

关 键 词：光学薄膜 光学薄膜参数 包络线法 全光谱拟合反演法 包络线-全光谱拟合反演法 

分 类 号：O484[理学—固体物理]