高硅去除率电去离子技术制备高纯水的研究  

THE REMOVAL OF SILICON IN PRODUCING HIGH PURITY WATER BY BIPOLAR MEMBRANE ELECTRODEIONIZATION

作　　者：王乡音 王建友[1] 卢会霞[1] 柴萍[1] 李卜义 

机构地区：[1]南开大学环境科学与工程学院,天津300071

出　　处：《水处理技术》2015年第4期77-80,84,共5页Technology of Water Treatment

摘　　要：将BM引入到CEDI中,构建了BMEDI装置,研究其对弱电解质硅去除的改进效果,并将其与CEDI进行对比考察。结果表明,以一级RO水为进水,在膜堆电流低于0.08A时,BMEDI在产水水质上稍优于CEDI且其膜堆电阻较CEDI更低。进一步以人工添加进水Si含量的方式对BMEDI与CEDI进行考察,在进水Si的质量浓度分别为0.5、1.0、1.5、2.0 mg/L条件下,BMEDI的产水水质和除Si效果均优于CEDI;在上述的进水条件下继续运行25 h,当进水Si的质量浓度为1.5 mg/L时BMEDI的Si去除率和产水电阻率分别达到94.65%和15.0 MΩ·cm,而CEDI则已下降至61.25%和10MΩ·cm。研究表明BMEDI能够适应较高的原水Si含量而稳定制取高纯水,对工业及实验室超纯水的制备具有应用前景。A new bipolar membrane electrodeionization（BMEDI） was prepared by coupling the bipolar membrane to conventional electrodeionization（CEDI）,and improvement of Si removal by this newly developed BMEDI was investigated.The results indicated that when reverse osmosis water was feed and the stack current was lower than 0.08 A,BMEDI was slightly better than CEDI on the product water quality,and its stack electrical resistance was lower than CEDI.Then we added self-regulating Na2 Si O3solution into feed water to investigate the stability in Si removal rate by BMEDI and CEDI.The results showed that BMEDI could reach better product water quality and higher Si removal rate than CEDI with the mass concentration of Si in range of 0.5-2.0 mg/L.When the mass concentration of Si was 1.5 mg/L in the feed water,the Si removal rate and resistivity of water produced by BMEDI were94.65% and 15.0 MΩ·cm,respectively.However,the silicon removal rate and resistivity of water produced by CEDI declined to 61.25% and 10 MΩ·cm under the same operation conditions.The results indicated that BMEDI could produce high quality water stably even though Si concentration in feed water was high,which hold great promising in the preparation of ultrapure water for industrial and experimental purpose.

关 键 词：双极膜 电去离子 高纯水 硅 

分 类 号：TQ028.8[化学工程]