UV/H_2O_2联用工艺降解小分子羧酸的研究  

Study on Degradation of Small Molecular Carboxylic Acid by UV/H_2O_2 System

作　　者：李旺[1] 张永丽[1] 张静[1] 颜丹骏 

机构地区：[1]四川大学建筑与环境学院,四川成都610065

出　　处：《资源开发与市场》2015年第5期518-522,共5页Resource Development & Market

基　　金：教育部创新团队项目(编号:ITR1027)

摘　　要：UV/H2O2联用工艺相对单独UV工艺和单独H2O2工艺对羧酸的降解率更高,主要是由于UV激发H2O2产生了氧化性更强的羟基自由基。通过在不同H2O2浓度下UV/H2O2联用工艺对甲酸、草酸、水杨酸三种小分子羧酸的降解实验发现,不同种类的羧酸存在一个最适H2O2浓度。低于最适浓度,H2O2浓度每增加一定值,羧酸的最大降解率增加量随之增加;高于最适浓度,最大降解率增加量随之减少。UV/H2O2工艺对小分子羧酸的降解率与羧酸分子的结构和相对分子质量有关,结构越复杂,相对分子质量越高,小分子羧酸的降解率越低。UV/H2O2 system could degradate more earboxylic acid compared with the single UV or H2O2 , because H2O2 could be converted to hydroxyl radicals by UV. Adjusted the concentration of H2O2 in the UV/H2O2 system on the degradation of formic acid, oxalic acid, salicylic acid, this paper found there was a optimal H2O2 concentration, the increment of degradation rate of carboxylic acid increased with the quantitative increase of concentration of H2O2 when the H2O2 concentration was lower than the optimal one, and reduced on the contrary. The degradation rate of small molecular carboxylic acid on UV/H2O2 system related to the molecular structure and the relative molecular mass. When the structure of carboxylic acid was more complex, the relative molecular mass was higher, the degradation rate was lower.

关 键 词：UV H2O2 小分子羧酸 

分 类 号：X783.1[环境科学与工程—环境工程]