薄膜滤光片镀膜工序能力指数分析  

Analysis on C_(pk) for Thin Film Filter Deposition

作　　者：陈凤金[1] 苏现军[1,2] 司俊杰[1,2] 王三煜[1,2] 

机构地区：[1]中国空空导弹研究院,河南洛阳471009 [2]红外探测器技术航空科技重点实验室,河南洛阳471009

出　　处：《半导体光电》2014年第5期855-857,880,共4页Semiconductor Optoelectronics

摘　　要：阐述了工序能力指数（Cpk）的理论原理及计算方法。通过对某带通滤光片截止区域截止点所在波长位置的统计分析,从截止点（透过率T为5%的点）的分布情况,计算分析得出其Cpk值主要在1.0～1.33之间。提出了有效提高滤光片镀膜工序能力指数的方法和途径,包括减小参数分布的标准偏差δ、优化调整工艺条件,以及尽可能减小工艺参数分布中心μ与规范中心值T0之间的偏离等。The principles and calculation methods of the process capability index （Cpk） were introduced. Based on statistical analysis on the cutoff wavelength of a certain bandpass filter, the Cpk of the thin film filter was calculated to be 1.0～1.33 from the distribution of the points of 5 % transmittance. The methods for increasing the Cpk of the thin film filter deposition are put forward, such as reducing the relative standard deviationsδ, optimizing the technological conditions, reducing the deviation of the technological parameters between the distribution center central μand the standard central value TO.

关 键 词：薄膜滤光片 镀膜 CPK 标准偏差 

分 类 号：TH162.1[机械工程—机械制造及自动化]