铼掺杂对含钪阴极性能与微观结构的影响  

Emission Property and Microstructure of Re Doped Cathode

作　　者：王金淑[1] 田恬[1] 刘伟[1] 赖陈 周帆[1] 赵雷[1] 

机构地区：[1]北京工业大学材料科学与工程学院,北京100124

出　　处：《北京工业大学学报》2015年第4期481-485,共5页Journal of Beijing University of Technology

基　　金：国家自然科学基金资助项目(51225402;51471006)

摘　　要：为了研究铼掺杂对含钪阴极性能与微观结构的影响,采用液-液掺杂结合两步氢还原法制备出掺杂Re的氧化钪掺杂钨粉R5S5(Sc2O3(w=5%)、Re2O7(w=5%)),并在此基础上经过压制、烧结、浸盐、清洗、退火工艺后制备出掺铼阴极.结果表明:阴极孔度合适,孔结构良好,孔分布均匀,颗粒达到亚微米级.该阴极的发射测试结果显示,在850℃b时,Jdiv为30.14 A/cm2.阴极表面的纳米小颗粒导致颗粒附近局部场强的增加,进而有利于阴极发射性能的提高.To study emission property and microstructure of Re doped cathode,the Sol-Gel combined with a two-step hydrogen reduction method was adopted to fabricate R5S5（ 5% Sc2O3＋ 5% Re2O7） codoped tungsten powder. The rare-earth doped matrix cathodes were prepared by the pressing,sintering,impregnating and ultra-sonic watering. Microstructure and emission property of cathodes were investigated by modern analysis techniques, such as SEM and UHV electron emission surveyor. The emission properties of R5S5 cathodes were excellent,i. e.,the current density Jdivreaching 30. 14 A / cm2 at 850 ℃b. The local electric fields around the nanoparticles on the cathode surface increased,resulting in the improvement of emission property of the cathode.

关 键 词：氧化钪 钨 表面分析 

分 类 号：TG146.4[一般工业技术—材料科学与工程]