全硫酸盐常温三价铬镀铬工艺  

Room-temperature sulfate trivalent chromium plating process

作　　者：王超 周长虹 

机构地区：[1]宁波市电镀行业协会,浙江宁波315199 [2]武汉奥邦表面技术有限公司,湖北武汉430023

出　　处：《电镀与涂饰》2015年第7期396-400,共5页Electroplating & Finishing

摘　　要：介绍了DS-5000硫酸盐体系三价铬电镀工艺,详细说明了镀液中各成分的作用、镀液维护和工艺条件。赫尔槽试验和阴极极化曲线测量表明,该工艺的镀液分散能力、覆盖能力、极化值和镀层外观等均略优于国外某同类产品。该工艺在常温下操作,镀液十分稳定,突破了许多硫酸盐三价铬镀铬生产中p H总是下降的问题,且基本不生成六价铬离子,维护相对容易。A sulfate trivalent chromium plating process coded as DS-5000 was introduced. The function of individual bath component, bath maintenance, and process conditions were described. The results of Hull cell test and cathodic polarization curve measurement showed that the process has slightly better throwing power, covering power, and polarization value of bath as well as coating appearance than a similar product used abroad. The process is operated under room temperature and features high bath stability. Its maintenance is relatively simple due to the fact that the problem of pH decline always happened in sulfate trivalent chromium plating is solved and hexavalent chromium ions are nearly not generated during the plating production.

关 键 词：三价铬电镀 硫酸盐 常温 维护 

分 类 号：TQ153.11[化学工程—电化学工业]