基于LabVIEW可编程电化学脉冲湿法刻蚀系统设计  

Programmable Pulse Electrochemical Wet Etching System Based on LabVIEW

作　　者：苗凤娟[1,2] 李倩倩[1] 陶佰睿[1,2,3] 赵柯洋[1] 张嘉[1] 高玉峰[1] 

机构地区：[1]齐齐哈尔大学通信与电子工程学院,黑龙江齐齐哈尔161006 [2]中国科学院上海技术物理研究所红外物理国家重点实验室,上海200083 [3]齐齐哈尔大学计算中心,黑龙江齐齐哈尔161006

出　　处：《半导体光电》2015年第1期71-74,共4页Semiconductor Optoelectronics

基　　金：中国博士后科学基金面上项目(2012M510898);国家自然科学青年基金项目(61204127);黑龙江省自然科学基金项目(F201332;F201438);黑龙江省普通高等学校新世纪优秀人才培养计划项目(1253-NECT025);黑龙江省教育厅科学技术研究项目(12531774);黑龙江高等学校教改工程项目(JG2012010671)

摘　　要：针对电化学湿法刻蚀硅微加工需求,基于LabVIEW软件开发平台,利用上位机、可编程直流稳压电源PSM-6003、低温控制和LED光辐照等设备搭建了一种新型可编程电化学湿法刻蚀装置。其中基于LabVIEW的PSM-6003上位机控制软件,可以通过图形界面对系统各种参数实时设置,例如刻蚀电压幅值、刻蚀脉冲频率和占空比、刻蚀电流和刻蚀时间以及刻蚀系统的辅助光照和环境温度等,系统各参数监控和动作执行主要利用美国NI公司PCI-6221数据卡实现。该系统成本低、操作简便、可模块化安装,对促进实验室电化学湿法刻蚀微加工设备的研制有重要借鉴意义。To solving the requirements of electrochemical wet etching of silicon micromachining, a novel programmable electrochemical wet etching device is designed by using the equipments such as PC, programmable DC regulated power supply PSM-6003, lower temperature controlling and LED light irradiation equipment based on LabVIEW. The PSM-6003 PC control software based on LabVIEW can be used to set the system parameters real-time through the graphical interface, such as the etching pulse voltage amplitude, frequency and duty ratio, etching current, etching time, auxiliary lighting intensity and environment temperature. The system＇s monitoring and working actions are mainly realized by using PCI-6221 card made by NI. This system is characterized by low cost, easy operation and modularity set-up, so it makes important significance for promoting the development of the electrochemical wet etching of micromachining equipments used in laboratories.

关 键 词：硅微加工平台 电化学湿法刻蚀 可编程脉冲 低温控制 光辐照设备 

分 类 号：TN305.7[电子电信—物理电子学]