基于工位自控制的全自动单片清洗设备的软件设计  

Software Design of Automatic Single Wafer Cleaning Equipment Based On Workstation Self-control

作　　者：高建利[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2015年第1期39-42,共4页Equipment for Electronic Products Manufacturing

摘　　要：为了更好的控制全自动单片清洗设备,通过研究设备的结构和运行流程,提出了一种基于工位自控制的方法实现设备自动运行的软件设计,使各工位并行运行,提高了运行效率。In order to better control of the automatic single wafer cleaning equipment, offered a software design based on workstation self-control that made equipment auto run through the study of equipment＇s structure and running flow of automatic. It made each workstation run in paralleled and increased running efficiency.

关 键 词：半导体设备 自控制 单片清洗 软件设计 

分 类 号：TN305[电子电信—物理电子学]