PECVD的原理与故障分析  

The Principle and Fault Analysis of PECVD

作　　者：曹健[1] 

机构地区：[1]中国电子科技集团公司第十三研究所,河北石家庄050051

出　　处：《电子工业专用设备》2015年第2期7-10,共4页Equipment for Electronic Products Manufacturing

摘　　要：介绍了PECVD工艺的种类、工艺原理以及设备的基本结构;根据多年对设备的维护经验,分析了PECVD设备的常见原因,提出了处理措施;最后,分析总结了影响PECVD工艺质量的主要因素。This paper introduces the types of PECVD process technique, process principle, as well as the basic structure of the equipment. According to years of experience in equipment maintenance, a common cause of PECVD equipment technique are analyzed, and treatment measures are put forward.Finally, the analysis of main factors affecting the quality of PECVD process technique are summarized.

关 键 词：化学气相淀积 等离子增强型化学气相淀积 故障分析 工艺维护 

分 类 号：TN304.055[电子电信—物理电子学]