纳米激光粒度仪在硅溶胶粒度测试中的应用研究  

Application of Zetasizer Nano ZS in particle size test on silica sol

作　　者：徐明艳[1] 代克[1] 王乐军[1] 周万里[1] 

机构地区：[1]郑州磨料磨具磨削研究所有限公司,郑州450001

出　　处：《金刚石与磨料磨具工程》2015年第2期55-58,共4页Diamond & Abrasives Engineering

基　　金：科技型中小企业创新基金中小企业公共技术服务机构补助资金(07C26244101670)

摘　　要：使用Zetasizer Nano ZS型纳米激光粒度仪分别对GRJ10030和GRJ10050(氧化硅质量分数30%、50%,粒径约100nm)的两种硅溶胶进行了粒度检测。结果发现:原液中存在多重散射及粒子间的相互作用。随稀释倍数增加,多重散射及粒子间相互作用被削弱,氧化硅质量分数低于10%时,两种硅溶胶的平均粒径(Z-Ave)值、多分散系数(PDI)值、粒度分布等均分别趋于一致。GRJ10030型硅溶胶5倍稀释液,GRJ10050型硅溶胶20倍稀释液,有相对集中、稳定的粒度分布,且测试重现性良好。Particle size and Zeta potential measurement on silica sols which sized 100 nm and mass fraction SiO230%, 50% respectively, were carried out by laser particle size analyzer scaled nanometer. It was founded that there existed multiple scattering phenomena and interactions between colloidal particles, which were both weakened as SiO2 contents decreased. When the SiO2 mass fraction were less than 10%, the values of Z-average size （Z-Ave） and polydispersity index （PDI）, and particle size distribution becoming consistent with each other respectively. GRJ10030 silicon sol diluted at 5 times, and GRJ10050 silicon sol diluted at 20 times, had relatively concentrated, stable particle size distribution and showed good test reproducibility.

关 键 词：Zetasizer NANO ZS 硅溶胶 纳米激光粒度仪 测试 

分 类 号：TG73[金属学及工艺—刀具与模具]