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作 者:赵扬[1] 姜佳昕 陈冬阳[1] 郑高峰[1] 孙道恒[1]
出 处:《光学精密工程》2015年第4期1062-1069,共8页Optics and Precision Engineering
基 金:国家自然科学基金资助项目(No.51305373);福建省科技计划重大项目(No.2012H6022);福建省自然科学基金资助项目(No.2013J05083)
摘 要:研究了一种带辅助气体的新型纳米颗粒多射流高效雾化喷射技术。开发了带有辅助气流的多喷嘴静电雾化喷头,引导辅助气体均匀分布于各喷嘴四周形成稳定鞘层气流,从而对带电雾化射流产生拉伸与约束作用,而形成的鞘层气流降低了表面电荷密度,克服了带电喷嘴间的电场干扰,实现了多雾化射流的稳定、持续喷射。研究了静电雾化多射流的喷射、沉积行为,分析了辅助气体供气压强对射流喷射临界启动电压和纳米颗粒均匀性的影响规律。实验结果显示:辅助鞘层气流降低了射流喷射临界启动电压和雾化颗粒直径,提升了雾化纳米颗粒的均匀性。辅助气体供气压强从0kPa增加到50kPa时,雾化多射流喷射临界启动电压从4.9kV降低至2.8kV,纳米颗粒平均直径从845.267nm下降至528.06nm。结果表明:鞘层气流的引入为纳米颗粒的多射流、快速喷射提供了一种有效的技术手段,有助于推动静电雾化技术的应用发展。A novel multi-jet electrospray with assisted gas was explored to eject nano particles in a high efficiency.The electrospray spinneret with multi nozzles was designed to guide the assisted gas to form the uniform sheath gas around each nozzle and to provide the excess stretching and restriction forces on the charged electrospray jets.The obtained sheath gas decreases the surface charge density of charged electrospray jets and the interferences among charged jets and makes stable multi electrospray jets for continuously ejection for a long time.The ejection and deposition behaviors of multi electrospray jets were investigated and the effects of sheath gas on the threshold voltage of multi electrospray jet ejection and the uniformity of nano particles were analyzed.The experiments show that the sheath gas is beneficial to the decrease of threshold voltages of multi electrospray jets and the diameters of electrospray nano particles and to the increase of the uniformity of nano particles.When the supply pressure of assisted gas increases from 0kPa to 50 kPa,the threshold voltage of multielectrospray jet ejection decreases from 4.9kV to 2.8kV and the average diameter of nano particles decreases from 845.267 nm to 528.06 nm.It concludes that introducing the assisted gas into electrospray spinneret provides a good way to rapidly fabricate the nano particles through multi-jet electrospray.This work would promote the application research of electrospray technology.
关 键 词:静电雾化 纳米颗粒 多射流喷射 鞘层气流 约束聚焦
分 类 号:TB383[一般工业技术—材料科学与工程] TP67[自动化与计算机技术—控制理论与控制工程]
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