深紫外光刻光学薄膜  

Optical coatings for DUV Lithography

作　　者：张立超[1] 才玺坤[1] 时光[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春130033

出　　处：《中国光学》2015年第2期169-181,共13页Chinese Optics

基　　金：国家科技重大专项资助项目(No.2009ZX2005)

摘　　要：深紫外波段是目前常规光学技术的短波极限,随着波长的缩短,深紫外光学薄膜开发面临一系列特殊的问题;而对于深紫外光刻系统这样的典型超精密光学系统来说,对薄膜光学元件提出的要求则更加苛刻。本文主要介绍了适用于深紫外光刻系统的薄膜材料及膜系设计;对薄膜沉积工艺、元件面形保障、大口径曲面均匀性等超精密光学元件的指标保障关键问题进行了讨论;对环境污染与激光辐照特性等光刻系统中薄膜元件环境适应性的重要因素进行了深入分析。以上分析为突破高性能深紫外光刻光学薄膜开发瓶颈,更好地满足深紫外光刻等极高精度光学系统的应用需求指明了方向。Deep-ultraviolet （DUV） is the shortest wavelength of conventional optical techniques. With the wavelength shrinks, DUV optical coatings are confronted with a series of technical problems. As a kind of typ- ical ultra precision optical system, DUV lithography system proposes stringent requirements on DUV coating optics. In this paper, coating materials and the coating design procedures of DUV coatings are summarized. Then, key problems on the guarantee of optical properties are discussed such as coating deposition techniques, surface figure preservation of coated optics, coating thickness distribution correction of large curved surfaces. Finally, detailed analysis for the environmental adaptability of DUV coatings are made to critical factors such as the environmental contaminations and the laser irritation characters. The above analysis points out directions to breakthrough bottlenecks on the development of DUV lithograph coatings and meet the requirements of ultra- precision DUV optical systems.

关 键 词：深紫外光刻 超精密光学 膜系设计 光学性能保障 环境适应性 

分 类 号：O484[理学—固体物理]