沉积条件对SiO_2光子晶体表面形貌的影响  

Influence of Deposition Conditions on Surface Morphology of SiO_2 Photonic Crystal

作　　者：闫刚印[1,2] 杭联茂[1] 孟江[1] 赵亚妮[1] 何磊 

机构地区：[1]西藏民族学院西藏自治区光信息处理与可视化技术重点实验室,咸阳712082 [2]兰州大学物理科学与技术学院,兰州730000

出　　处：《硅酸盐通报》2015年第4期1127-1132,共6页Bulletin of the Chinese Ceramic Society

基　　金：西藏自治区自然科学基金项目;西藏民族学院青年学人培育计划(15MYQP05)

摘　　要：自组装制备是一种常用的三维光子晶体制备方法,在制备光子晶体过程中影响薄膜质量的因素较多。本研究对原始的双基片垂直沉积法进行了一定的改进,控制光照强弱、蒸发速度快慢等条件,沉积了不同的SiO2光子晶体薄膜样品。通过与单基片垂直沉积法得到的薄膜样品进行比较,得到了双基片垂直沉积法沉积光子晶体薄膜样品的最优实验条件。Self-assembled is a common method for three-dimensional photonic crystals fabrication. There are many factors influencing on the quality of photonic crystals. In this work, different SiO2 photonic crystals were successfully fabricated by modifying two-substrate vertical deposition method with different evaporation rate and intensity of illumination. Through analysis on comparing with the SiO2 photonic crystals prepared by single-substrate vertical deposition method, the optimum experimental conditions to fabricate SiO2 photonic crystals have been found.

关 键 词：光子晶体 自组装 双基片垂直沉积 

分 类 号：O78[理学—晶体学]