三价铬电镀装饰铬新工艺  

Novel Process for Decorative Trivalent Chromium Plating

作　　者：郭崇武[1] 赖奂汶[1] 

机构地区：[1]广州超邦化工有限公司,广东广州510460

出　　处：《电镀与环保》2015年第3期11-14,共4页Electroplating & Pollution Control

摘　　要：开发了Trich-6771氯化物体系三价铬电镀装饰铬新工艺。在10A/dm2的电流密度下,沉积速率达到0.2μm/min,镀层厚度小于0.5μm。中性盐雾试验168h,乙酸盐雾试验96h,铜加速乙酸盐雾试验48h,镀层无明显变化。恒定湿热试验360h,镀层不长霉点。人造汗液测试和抗化学污染测试满足行业要求。A novel Trich-6771 process for decorative trivalent chromium plating in chloride system was developed. Under the conditions of current density 10 A/dm^2, the deposition rate reached up to 0. 2 μm/min and the thickness of chromium coatings was below 0. 5 μm. The chromium coatings do not tarnish after neutral salt spray test for 168 h. acetic acid salt spray test for 96 h and copper-accelerated acetic acid salt spray test for 48 h, and further, no mildews appeared after steady-state damp heat test for 360 h. Artificial sweat test and chemical contamination test satisfy the industry requirements.

关 键 词：三价铬电镀 沉积速率 耐蚀性 

分 类 号：TQ153[化学工程—电化学工业]