气态光源涂覆工艺中涂粉配方的优化  

Optimization of Coating Formula for Gaseous Light Sources in Coating Process

作　　者：邓蓓[1] 平杰红[1] 李思杰[1] 张利峰[1] 孙玉华[1] 韩世泉[1] 

机构地区：[1]中国原子能科学研究院同位素研究所,北京102413

出　　处：《同位素》2015年第2期69-74,共6页Journal of Isotopes

摘　　要：气态涂层光源是一种自激发光源，是利用放射性同位素发出的带电粒子激发荧光物质而发光的同位素照明装置。气态光源具有无需维护、无需外加电源，使用时不受温度、湿度、海拔高度以及使用技术影响的优点，应用广泛。荧光粉涂覆工艺是制备气态光源的关键技术之一。本研究采用单一变量的方法，通过改变荧光粉、粘结剂和固化剂等成分的比例选择更优的涂粉配方。阴极射线发光测量系统及扫描电镜结果表明，配方各成分含量分别为粘结剂PEO7.0～7.5 mL、荧光粉13～16 g、去离子水4.3 mL、添加剂0.45 m L和固化剂为7.3％～7.5％时涂覆效果较佳。As a self‐excitation light sources ,gaseous coating light sources is a kind of isotope illumination device which uses charged particles emitted by radioisotopes .For gaseous light sources ,there is no need for maintenance and additional pow er ,and it is not affected by temperature ,humidity ,altitude and technology ,which makes it widely used in national economy .The coating process of gaseous light sources is one of the key techniques for the preparation of light sources .T he single variable method by changing the ratio of compounds such as fluorescent powder ,binder and curing agent were used to achieve a better formulation of water coating process ,which was used in this coating process . The results showed that when the formulation ingredients contain PEO temporary binder was 7.0‐7.5 mL ,phosphor 13‐16 g ,deionized water 4.3 mL ,additive 0.45 mL and curing agent （7.3‐7.5）% ,the coating effect was better .

关 键 词：气态光源 水涂覆 涂粉配方 

分 类 号：TL99[核科学技术—核技术及应用]