原位刻蚀法制备TiO_2纳米线阳极薄膜  

IN-SITU ETCHING METHOD FOR TiO_2 NANOWIRE PHOTOANODE PREPARATION

作　　者：肖黎[1] 张永哲[1] 许佳[1] 姚建曦[1,2] 戴松元[1] 张兵[1] 潘旭[3] 

机构地区：[1]华北电力大学新型薄膜太阳电池北京市重点实验室,北京102206 [2]浙江大学硅材料国家重点实验室,杭州310027 [3]中国科学院等离子体物理研究所,合肥230031

出　　处：《太阳能学报》2015年第5期1278-1282,共5页Acta Energiae Solaris Sinica

基　　金：国家自然科学基金(51372083;51302081;51072051;21303049);新世纪优秀人才项目(NCET-11-0636);中央高校基本科研业务费(2014ZZD07;13QN21;13MS127);北京市科技新星项目(Z141109001814053);国家高技术研究发展(863)计划(2011AA050602)

摘　　要：采用水热法在FTO基板上制备Ti O2纳米线阵列,在此基础上,通过水热法采用HCl对该薄膜进行原位刻蚀。XRD结果表明刻蚀过程并未影响Ti O2纳米线阵列薄膜的结晶性。SEM结果表明刻蚀过程能有效降低纳米线之间的团聚程度,从而保证薄膜具有较大的比表面积。染料的吸附-脱附结果也表明,刻蚀后纳米线薄膜的染料负载能力提高了1倍,将制备的Ti O2纳米线阵列薄膜作为染料敏化太阳电池的光阳极进行光电性能研究,发现使用经过刻蚀处理光阳极的太阳电池比采用未刻蚀处理的光阳极薄膜的电池光电转换效率提高了6倍。TiO2 nanowire arrays were firstly prepared on FTO substrate by hydrothermal method. Then, etching process was taken through hydrothermal method again. The SEM characterization results showed that the cluster arrays can successfully split up by the etching process, thus guarantee the specific surface area of films. Dye absorption capability calculation results illustrated that the etching measure can enhance dye loading ability once. Furthermore, X-ray diffraction pattern reports showed that all the samples are single crystallized rntile TiO2 and oriented grown along [001 ]. The photoelectric characteristicof these photoanodes were studied after dye-sensitized solar cells （DSSCs） assembly. However, the photoelectric conversion efficiency （PCE） of the etched TiO2 photoanode based DSSC achieved 6 times higher than originally prepared anode.

关 键 词：染料敏化太阳电池 水热法 TiO2纳米线 原位刻蚀 

分 类 号：TM914[电气工程—电力电子与电力传动]