氧化钒薄膜制备工艺现状及发展  

Status and development of manufacture process of vanadium oxide thin film

作　　者：卫琛浩 朱军[1] 唐洋洋[1] 韩梅[1] 赵霞[1] 

机构地区：[1]西安建筑科技大学,陕西西安710055

出　　处：《中国有色冶金》2015年第3期75-78,共4页China Nonferrous Metallurgy

基　　金：陕西省2011科技统筹重大地方专项(2011KPDZ01-04)

摘　　要：我国钒产业发展迅速,开发钒新材料是钒产业可持续发展的重要途径。氧化钒薄膜具有从半导体到金属态的可逆性相变性能,其作为热敏材料具有广阔的应用前景。本文分析了常见氧化钒薄膜制备工艺的特点及应用情况,指出存在的问题,对我国氧化钒薄膜制备工艺的发展提出了建议。China vanadium industry is developing rapidly, the development of new materials of vanadium is an im- portant aspect of the sustainable development of vanadium industry. The vanadium oxide thin film has the property of reversible phase change from the semiconductor to metal, which has broad application prospects as the heat sen- sitive materials. Characteristics and applications of manufacture of some common vanadium oxide thin films were analyzed, existing problems were pointed out, meanwhile some suggestions of development of manufacture process of vanadium oxide thin film were made.

关 键 词：薄膜 钒氧化物 可逆相变 材料 

分 类 号：TB383.2[一般工业技术—材料科学与工程]