新型含二甲基硅单元的口恶二唑类化合物的合成与表征  

Synthesis and characterization of novel dimethyldiphenylsilane-containing 1,3,4-oxadiazole derivative compounds

作　　者：韩雪梅[1] 李东风[1] 

机构地区：[1]长春工业大学化学与生命科学学院,长春130012

出　　处：《化工新型材料》2015年第5期71-73,共3页New Chemical Materials

基　　金：吉林省科技厅自然科学基金(20101548)

摘　　要：设计和合成了两种新型的含有二甲基硅单元的口恶二唑类衍生化合物（SiOXD1和SiOXD2）以改善化合物的荧光性能和热稳定性。利用现代谱学方法和X-射线衍射分析确定了化合物的微观结构,通过傅里叶转换红外光谱、荧光光谱、紫外光谱和核磁共振分析表征了化合物的化学结构,利用热失重分析仪测试了化合物的热稳定性。分析结果表明：两种化合物表现出良好的荧光性能,荧光吸收波长分别在λEX280~325nm和λEM300~345nm左右。热失重分析表明,在空气氛围下,两种物质的失重温度区间分别在110~260℃和130~260℃左右。Two novel 1,3,4-oxadiazole derivative compounds （SiOXD1 and SiOXD2） contain dimethyldiphenylsilane were designed and synthesized in order to improve theirs photoelectric property and thermal stability. The microstructures of the two compounds were studied by modern spectroscopic methods and X-ray diffraction analysis. Fourier tansform infra- red spectroscopy（FT-iR）, fluorescence spectra, ultraviolet spectrum（UV）and 1 H-NMR were employed to characterize the chemical structures of the two compounds. Thermal stabilities were studied by thermal analyzer. The results indicated that the two compounds showed good fluorescence property with ）,λEX 280~325nm and λEM 300- 345nm, respectively. TG results showed the weight loss temperature range from 110℃ to 260℃ and 130℃ to 260℃ in air atmosphere,respectively.

关 键 词：1 3 4-口恶二唑衍生物 合成 荧光性能 热稳定性 

分 类 号：O626[理学—有机化学]