检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:袁小红[1,2] 魏取福[1] 陈东生[2] 徐文正[1]
机构地区:[1]江南大学生态纺织教育部重点实验室,无锡214122 [2]闽江学院服装与艺术工程学院,福州350108
出 处:《化工新型材料》2015年第5期140-143,共4页New Chemical Materials
基 金:国家高技术研究发展计划(863计划)资助项目(2012AA030313);福建省中青年教师教育科研项目资助(JA13260)
摘 要:在室温条件下采用磁控溅射技术在涤纶机织物表面沉积金属薄膜,利用原子力显微镜(AFM)分析溅射时间、溅射功率和气体压强等工艺参数对纳米金属薄膜表面形貌和表面粗糙度的影响,研究了溅射工艺参数与样品紫外线防护性能之间的关系。结果表明:同等工艺参数条件下,镀Ag膜试样的表面粗糙度要比镀Cu试样小很多,表面相对较为平整。溅射时间对镀Cu膜试样的表面粗糙度和紫外线防护性能影响最大,而溅射功率对镀Ag膜试样的表面粗糙度和紫外线防护性能影响最大,并分别给出了溅射Cu膜和Ag膜的最佳工艺参数。Nanoscale metal thin films were deposited on the surface of polyester weave fabric by magnetron sputte- ring process at room temperature. The influence of sputtering process parameters, such as sputtering time, sputtering pow- er,and gas pressure, on the surface morphology and surface roughness of film was analyzed by atomic force microscope (AFM). The relation between sputtering parameters and the anti-ultraviolet property of film was also investigated. Results of experiments showed that the surface roughness of sample coated with silver thin films was smaller than that of the sam- ple coated with copper thin films. The surface of the silver thin films was relatively smooth. The sputtering time had great influence on the surface roughness and anti-ultraviolet property of copper thin films, and sputtering power had great influ- ence on the surface roughness and anti-ultraviolet property of silver thin films. The optimum process parameters of sputte- ring copper thin films and silver thin films were obtained.
关 键 词:涤纶机织物 纳米金属薄膜 AFM分析 紫外线防护性能
分 类 号:TS156[轻工技术与工程—纺织材料与纺织品设计]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.43