基于纳米颗粒溶液散射的激光平场系统  

Laser flat-field system based on light scattering in nano-particle solution

作　　者：王秋实[1] 杨福桂[1] 刘丁枭 盛伟繁[1] 李明[1] 

机构地区：[1]中国科学院高能物理研究所北京同步辐射装置X射线光学与技术实验室,北京100049

出　　处：《光学精密工程》2015年第5期1213-1220,共8页Optics and Precision Engineering

基　　金：国家自然科学基金青年基金资助项目(No.Y11139005C)

摘　　要：根据对阵列探测器光电响应误差校正的要求,基于纳米颗粒溶液漫散射效应建立了能产生高平整度参考光场的激光平场系统。介绍了激光平场装置的结构和工作原理及光学设计中涉及的若干关键技术。使用光纤将激光高效地导入溶液中,通过优化光纤位置和腔体结构参数,在保证一定光场均匀度的前提下,提高系统的光能利用率,降低界面上的背向散射损耗。基于改进过的蒙特卡洛程序,数值计算了腔体材料反射率对系统透射率的影响。最后,利用现有的高反射率聚四氟乙烯材料,设计了激光平场系统。结果显示,光纤端口的最优位置取决于腔体反射率,对于高反射率的腔体材料,靠近腔体背部的光纤端口可以有效增强前向散射。设计的激光平场系统能够提供的光场均匀度好于0.3%,可基本满足长程面形仪等高精度激光测量装置中探测器误差校正的需求。To meet the demand of the high precision correction requirements of an array detector for photo-electronic response errors,a laser flat-field system based on diffuse scattering effect of nanoparticle solution was established to generate a reference light field with a high flatness.The structure and principle of the flat-field system were introduced and some key techniques involved in the design of optical system were also given.An optical fiber was used to deliver the laser into solution efficiently to reduce the backscattering light loss on the interface.By optimizing the fiber＇ s position and structure parameters of the cavity,the utilization of light energy was improved with a stable light field uniformity.Using improved Monte Carlo method,the effect of diffuse reflector cavity on system transmission was studied numerically.Finally,a laser flat field system was established by using Polytetrafluoroethylene（PTFE）materials with high reflectivity.Results show that the optimal position of the fiber depends on the cavity reflectivity.For high reflectance material,the optic port of the fiber near the cavity back can effectively enhance forward scattering.The laser flat field system provides the light field with a nonuniformity better than 0.3%,which basically meets the requirements of precision instruments for detector error correction,such as a long trace profiler.

关 键 词：激光平场系统 纳米颗粒 溶液 漫散射 CCD探测器 非均匀响应 校正 

分 类 号：O439[机械工程—光学工程] TN249[理学—光学]