表面粗糙度对面向等离子体钨材料溅射的影响  

Sputtering influence of Tungsten-based plasma facing material induced by surface roughness

作　　者：杨涛[1] 龚学余[1] 胡继文[1] 杜丹[1] 

机构地区：[1]南华大学,衡阳421001

出　　处：《核聚变与等离子体物理》2015年第2期175-180,共6页Nuclear Fusion and Plasma Physics

基　　金：国家自然科学基金(11375085;11205086);湖南省核聚变与等离子体物理创新团队建设项目(NHXTD03)

摘　　要：依据钨材料表面溅射的实验现象,建立钨材料表面粗糙模型,模拟了高能H+、He+粒子辐照下的钨材料表面的溅射行为过程,并与基于离子输运的双群模型计算得到的结果作了比较。结果表明,随着钨材料表面粗糙程度的增加,溅射率降低;对一定的粗糙表面,相同能量的不同入射粒子,质量越大粒子溅射率越高,这些结果为分析聚变装置中心等离子体杂质水平和评价偏滤器寿命等提供了一定的理论支撑。Based on experimental results of sputtering of tungsten surface, a model of surface roughness was constructed and the sputter of tungsten surface under the irradiation of high energy H＋ and He＋particles was simulated. The comparison with bipartition model of ion transport theory calculation results was provided. The results show that the sputtering rate decreases with increase of surface roughness of tungsten material. The sputtering rate increases with the particle mass for a certain rough surface and for the same energy of incident particles. These results provide some theoretical support to analyse the impurity level in core plasma of fusion reactors and estimate the lifetime of divertor.

关 键 词：粗糙度模型 钨材料 溅射率 

分 类 号：TL621[核科学技术—核技术及应用]