On study of horizontal thin film flow of Sisko fluid due to surface tension gradient  

作　　者：A.M.SIDDIQUI H.ASHRAF A.WALAIT T.HAROON 

机构地区：[1]Department of Mathematics,York Campus,Pennsylvania State University [2]Department of Mathematics,COMSATS Institute of Information Technology

出　　处：《Applied Mathematics and Mechanics(English Edition)》2015年第7期847-862,共16页应用数学和力学（英文版）

摘　　要：The present paper is concerned with the steady thin film flow of the Sisko fluid on a horizontal moving plate, where the surface tension gradient is a driving mechanism. The analytic solution for the resulting nonlinear ordinary differential equation is obtained by the Adomian decomposition method （ADM）. The physical quantities are derived including the pressure profile, the velocity profile, the maximum residue time, the stationary points, the volume flow rate, the average film velocity, the uniform film thickness, the shear stress, the surface tension profile~ and the vorticity vector. It is found that the velocity of the Sisko fluid film decreases when the fluid behavior index and the Sisko fluid parameter increase, whereas it increases with an increase in the inverse capillary number. An increase in the inverse capillary number results in an increase in the surface tension which in turn results in an increase in the surface tension gradient on the Sisko fluid film. The locations of the stationary points are shifted towards the moving plate with the increase in the inverse capillary number, and vice versa locations for the stationary points are found with the increasing Sisko fluid parameter. Furthermore, shear thinning and shear thickening characteristics of the Sisko fluid are discussed. A comparison is made between the Sisko fluid film and the Newtonian fluid film.The present paper is concerned with the steady thin film flow of the Sisko fluid on a horizontal moving plate, where the surface tension gradient is a driving mechanism. The analytic solution for the resulting nonlinear ordinary differential equation is obtained by the Adomian decomposition method （ADM）. The physical quantities are derived including the pressure profile, the velocity profile, the maximum residue time, the stationary points, the volume flow rate, the average film velocity, the uniform film thickness, the shear stress, the surface tension profile~ and the vorticity vector. It is found that the velocity of the Sisko fluid film decreases when the fluid behavior index and the Sisko fluid parameter increase, whereas it increases with an increase in the inverse capillary number. An increase in the inverse capillary number results in an increase in the surface tension which in turn results in an increase in the surface tension gradient on the Sisko fluid film. The locations of the stationary points are shifted towards the moving plate with the increase in the inverse capillary number, and vice versa locations for the stationary points are found with the increasing Sisko fluid parameter. Furthermore, shear thinning and shear thickening characteristics of the Sisko fluid are discussed. A comparison is made between the Sisko fluid film and the Newtonian fluid film.

关 键 词：thin film flow Sisko fluid model horizontal moving plate surface tension gradient analytic solution Adomian decomposition method （ADM） 

分 类 号：O552.421[理学—热学与物质分子运动论]