多模式旋转磁场对电弧离子镀弧斑放电的影响分析  

Effect of Magnetic Field Rotating in Multi-Mode on Arc-Spot Discharge in Arc Ion Plating

作　　者：郎文昌[1] 高斌[1] 杜昊[2] 肖金泉[2] 谢婷婷[1] 王向红[1] 

机构地区：[1]温州职业技术学院材料成型工艺与模具技术重点实验室,温州325035 [2]中国科学院金属研究所材料表面工程研究部,沈阳110016

出　　处：《真空科学与技术学报》2015年第6期662-670,共9页Chinese Journal of Vacuum Science and Technology

基　　金：浙江省自然科学基金项目(LQ12E01003);浙江省科技厅公益计划项目(2012C21099)

摘　　要：电弧离子镀工艺中,弧斑的放电形式、运动速率、运动方式的控制对于减少以至消除大颗粒的发射至关重要。本文采用自主研发的机械式旋转磁控弧源,围绕三种不同模式的旋转磁场下弧斑的放电行为及规律进行了研究,并从弧斑放电的物理机制出发,分析讨论了不同模式的旋转磁场对阴极斑点运动的影响机理。研究结果表明,多模式旋转磁场可以有效提高弧斑的运动速度、扩大放电面积、降低放电功率密度、减少大颗粒的发射,同时还能够大幅度提高靶材的利用率,拓展电弧离子镀的应用。The impact of the rotating modes of magnetic field on the am-spot trajectory in arc ion plating was ap- proximated, modeled, simulated in finite dement method （FEM）, and measured with a lab-biult arc-source controlled by mechanically rotating magnetic field, to effectively eliminate macro-particle emssion. The permanent magnet conflgura- dons,responsible for rotating modes of magnetic field,include Mode-I,a monopole of permanent magnet siting at 1/2 R away from the rotating axis; Mede-II, magnetic quadmpoles of two pairs of N- and S-poles with the center situated at about 1/3 R from the axis;and Mode-III,a circular array of S-poles surrounding an N-pole fixed at about 1/3 R away from the axis. The simulated and measured results show that the rotating modes significantly affect the trajectary of the am-spot to a varying degree.To be specific, the multi-mode rotating of magnetic field increases the velocity of am-spot, enlarges the discharge area, decrease the discharge power density, curbs the macro-particle emission, strongly enhances the target utilization-ratio, and widens application of arc ion plating technology in film growth.

关 键 词：机械式旋转磁控弧源 旋转不对称偏心轴向磁场 旋转偏心横向磁场 旋转偏心四极对顶磁场 旋转偏心拱形磁场 

分 类 号：TB43[一般工业技术] TG174.4[金属学及工艺—金属表面处理]