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作 者:王晓宇[1] 李华芳[1] 石嵩[1] 唐仕川[1] 王金良[2]
机构地区:[1]北京市劳动保护科学研究所职业安全健康重点实验室,北京100054 [2]北京航空航天大学物理科学与核能工程学院,北京100191
出 处:《人工晶体学报》2015年第5期1203-1206,共4页Journal of Synthetic Crystals
基 金:北京市科学技术研究院市级财政项目(PXM2014-178304-000002-00130228)
摘 要:本文采用磁控溅射系统在非晶硅薄膜的表面沉积不同覆盖度的银纳米颗粒,并研究纳米颗粒的表面覆盖度对非晶硅薄膜光吸收特性的影响。结果表明随着纳米颗粒表面覆盖度的增加,薄膜的晶格结构并不受影响。但是,随着表面覆盖度的增加,薄膜在近红外区域内对光的吸收范围却发生了明显变化。当纳米颗粒的表面覆盖度达到8%时,薄膜在近红外区域内对光的吸收范围达到了最大。这主要是由于纳米颗粒的局域表面等离子体增强了光吸收。Silver nanoparticles with different surface coverages were deposited on amorphous silicon thin film surfaces using magnetron sputtering. The influence of nanoparticle surface coverage on the optical absorption properties of amorphous silicon thin film was investigated. The results show that the lattice structure of thin film is not affected with the increase of nanoparticle surface coverage. However, with the surface coverage increasing, the optical absorption coefficient of the thin film changes obviously in the near-infrared region. When the nanoparticle surface coverage increases to 8%, the maximum optical absorption coefficient of the thin film is reached in the near-infrared region. It is mainly due to the enhancement of optical absorption via localized surface plasmon in nanoparticles.
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