大尺寸HVPE反应器托盘温度的数值模拟研究  

Numerical Simulation Study on the Susceptor Temperature in Large-scale HVPE Reactor

作　　者：赵江[1] 左然[1] 刘鹏[2,3] 童玉珍[2,3] 张国义[2,3] 

机构地区：[1]江苏大学能源与动力工程学院,镇江212013 [2]北京大学物理学院宽禁带半导体研究中心,北京100871 [3]东莞中镓半导体科技有限公司,东莞523500

出　　处：《人工晶体学报》2015年第7期1849-1854,共6页Journal of Synthetic Crystals

基　　金：国家自然科学基金(61176009);国家自然科学基金重大仪器装备专项(61327801);国家重点基础研究发展计划(973)(2011CB013101);国家高技术研究发展计划(863)(2014AA032605);广东省引进创新科研团队计划(2009010044)

摘　　要：对大尺寸氢化物气相外延(HVPE)反应器的流场和温场进行二维数值模拟研究,旨在提高托盘表面温度和温度分布均匀性。基准模拟显示,靠近喷头的加热器对托盘温度的影响大于底部加热器,随着加热器功率增大,温度分布均匀性变差。在基准模拟的基础上,提出在反应器底部设置隔热钼屏的托盘升温方法。优化后的模拟显示,托盘温度升高约48 K,而温度均匀性变化不大。在使用4层钼屏的基础上,通过在石墨托盘内部开圆柱槽,显著提高了托盘温度分布均匀性,并使温度进一步提升约5 K。In order to increase the susceptor temperature and the temperature uniformity for a large-scale hydride vapour phase epitaxy （HVPE） reactor, two-dimensional numerical modeling was performed for the flow and temperature fields in the HVPE reactor. The base modeling results show that, the heater near the vicinity of showerhead affects the susceptor temperature more than the heater near the bottom, and with increasing heater power the susceptor temperature uniformity is deteriorated. On the basis of the base modeling, adding Mo radiation shields at the reactor bottom to elevate the susceptor temperature was prepared. The optimized results show that, the susceptor temperature increases by about 48 K and the temperature uniformity changes little. In addition, a cylindrical slot was cut inside the susceptor with four pieces of Mo shields installed, and the uniformity of the susceptor temperature is optimized significantly, while the temperature is further elevated by about 5 K.

关 键 词：HVPE反应器 数值模拟 温场 

分 类 号：TN304[电子电信—物理电子学]