自支撑CsI/PC膜及其X射线光电转换性能研究  

Self-supported CsI/PC membrane and its photoelectric conversion property

作　　者：黎宇坤[1] 樊龙 陈韬[1] 邓博[1] 李晋[1] 邓克立 胡昕[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2015年第8期92-96,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金青年基金项目(10905050);中国工程物理研究院发展基金项目(2013B0102011)

摘　　要：为了获得大面积自支撑的高效率X射线光电转换材料,通过化学气相沉积和热蒸发镀膜工艺,制备出了大面积自支撑的CsI/PC膜,其中PC(聚碳酸酯)膜厚度为300nm,CsI膜厚度在100nm到1μm。通过扫描电镜、X射线衍射仪研究了镀膜速度和受潮对样品表面形貌结构的影响。利用MANSON光源的X射线对不同沉积速率和受潮程度的样品的X射线转换效率进行了研究。在北京同步辐射装置标定了样品X射线光电转换效率,其响应灵敏度峰值大于3000μA/W;将样品作为X射线光电阴极应用在X射线条纹相机上,在神光Ⅲ主机平台上获得了清晰的X射线图像。A self-supported PC membrane was prepared through chemical vapor deposition process, and CsI was evaporated onto PC surface. Then a large-area self-supported CsI/PC membrane was prepared. The thickness of PC membrane was 300 nm, and that of CsI membrane was controlled between 100 nm to 1 μm. The effects of deposition speed and deliquescence on morphology and structure were analyzed by SEM and XRD. The photoelectric conversion property was analyzed by Manson X-ray source. The energy spectral response peak value of CsI/PC membrane was above 3000 μA/W which was calibrated at Beijing synchrotron radiation facility. The membrane was applied to X-ray streak camera on SG Ⅲ facility and distinct X-ray images were captured.

关 键 词：自支撑薄膜 CSI 光电转换 X射线 谱响应灵敏度 

分 类 号：O434.1[机械工程—光学工程]