R&D投入强度与区域专利申请密度相关性研究  

An Empirical Research on the Correlation between R&D Investment Intensity and Regional Patent Application Density

作　　者：徐明[1] 

机构地区：[1]华东理工大学法学院,上海200237

出　　处：《情报杂志》2015年第7期100-104,76,共6页Journal of Intelligence

摘　　要：以我国31个区域2011-2013年R&D投入强度和区域专利申请密度的面板数据为样本,对R&D投入强度与区域专利申请密度之间的相关性进行了分析。结果表明:在低R&D投入区域中,R&D投入强度与区域专利申请密度呈现出负相关;在中R&D投入区域中,R&D投入强度与区域专利申请密度呈现出非显著正相关;在高R&D投入区域中,R&D投入强度与区域专利申请密度呈现显著正相关。在制定R&D政策的同时需要考虑不同区域的异质性特征,并且R&D投入强度必须达到一定水平,才能够有效地激励专利申请的产出效率。In this paper,we focus on the correlation between R＆D investment intensity and regional patent application density in the 31 re- gions of China. The result shows that： in low R＆D investment regions, there is a negative correlation between R＆D investment intensity and regional patent application. In middle R＆D investment regions, there is a non-significant correlation between RS^D investment intensity and regional patent application. In high R＆D investment regions,there is a significant correlation between RS^D investment intensity and re- gional patent application. Based on the result, we suggest that the policies advanced must take the regional differences into consideration and the regional R＆D investment intensity should be high enough to effectively encourage patent application.

关 键 词：R&D投入强度 专利密集型地区 区域专利申请密度 经验分析 

分 类 号：G306[文化科学]