超声预处理对纳米SiO_2的分散稳定性影响  

Influence of Ultrasonic Pretreatment on Stability of Nano-SiO_2 Dispersion

作　　者：刘春玲[1] 严芬英[1] 赵春英[1] 

机构地区：[1]沈阳理工大学环境与化学工程学院,辽宁沈阳110159

出　　处：《电镀与精饰》2015年第8期32-34,42,共4页Plating & Finishing

摘　　要：通过超声预处理法对纳米SiO2在水中分散稳定性影响因素进行了研究,获得了较佳的超声条件(超声功率180W,t为30min,θ为35℃);并在此超声条件下得出了分散剂硅烷偶联剂(KH570)与六偏磷酸钠在纳米SiO2悬浮液中的最佳配比,对不同条件下纳米SiO2在水中的分散稳定性进行了评价。扫描电子显微镜分析结果表明,KH570与六偏磷酸钠复配与超声波预处理相结合的方法对纳米SiO2有较好的改性效果。The influencing factors of ultrasonic pretreatment in dispersion stability of nano-SiO2 in water were researched, and the relative optimum technique conditions of ultrasonic pretreatment were as follows ： the ultrasonic power was 180 W, ultrasonic time was 30 min and ultrasonic temperature was 35 ℃. The optimal ratio between silane coupling agent（KH570） and hexametaphosphate（SHMP） in nano-SiO2 suspension was found, and the dispersion stability of nano-SiO2 in different conditions was evaluated by scanning electron microscopy（SEM）. Results showed that KH570 and SHMP compounding, and ultrasonic pretreatment had good effects on the modification of nano-SiO2.

关 键 词：超声预处理 纳米SIO2 硅烷偶联剂 改性 分散稳定剂 

分 类 号：TQ127.2[化学工程—无机化工]