除油和蚀刻对ITO导电玻璃化学镀镍的影响  

The Influence of Degreasing and Etching to Electroless Nickel Plating on ITO Conductive Glass

作　　者：焦亚萍[1] 项腾飞 梅天庆[1] 任春春[1] 

机构地区：[1]南京航空航天大学材料科学与技术学院,江苏南京210016

出　　处：《电镀与精饰》2015年第8期35-39,共5页Plating & Finishing

摘　　要：实验采用碱性除油去除ITO导电玻璃表面的油污，用磷酸溶液进行蚀刻以提高化学镀镍镀层的结合力，以硫酸镍为主盐进行了化学镀镍。研究了除油和蚀刻的工艺条件对镀镍层性能的影响，确定了化学镀镍前处理的最佳工艺参数。结果表明，用碱性化学除油液在25～35℃，除油6min，用磷酸溶液在40℃左右，蚀刻3min的条件下进行前处理，所得镀层覆盖率高、选择性优，与基体的结合力良好。The alkaline degreasing had been used to remove the grease on the surface of ITO conductive glass, the etching with phosphoric acid solution had been used to improve the adhesion of nickel-plating layer,and then electroless nickel plating had been performed in solution with nickel sulfate as the main salt. The influences of degreasing and etching process conditions on the performance of nickel plate were analyzed, and the optimal pre-treatment process parameters of electroless nickel plating were determined. Results show that the obtained plating layers present high coverage, excellent selectivity and good adhesion when the alkaline chemical degreasing temperature is in the range of 25 - 35 ℃, the degreasing time is 6 minutes, the phosphoric acid etching temperature is 40 ℃, and the etching time is 3 minutes during the pretreatment of nickel plating.

关 键 词：ITO导电玻璃 化学镀镍 前处理 除油 蚀刻 

分 类 号：TQ153.12[化学工程—电化学工业]