高纯SiF_4气体中杂质的定量分析方法研究  

Research for Quantitative Analysis of Impurities in High Purity of Silicon Tetrafluoride Gas

作　　者：韦德举[1] 张文娟[1] 唐安江[1] 何元琴[2] 

机构地区：[1]贵州理工学院,贵州贵阳550003 [2]贵州大学,贵州贵阳550003

出　　处：《山东化工》2015年第16期98-100,共3页Shandong Chemical Industry

基　　金：贵州理工学院科学基金项目(NO:xjzk20130814)

摘　　要：高纯度四氟化硅(SiF4)是新型硅烷法制备多晶硅的一种重要原料,其纯度影响硅烷及多晶硅的纯度及用途。本文对国内外市场上SiF4产品质量做了对比分析,并对以氟硅酸为原料生产SiF4气体中:含氧氟硅化合物、碳氢化合物、氟化氢、金属元素、碘等杂质提出定量分析方法。为国内生产高端的SiF4产品检测提供帮助。High purity silicon tetrafluoride （ SiF4 ） is an important raw material of new method of silane made of polysilicon. Its purity effect the purity of silane and the purity of polysilieon and purposes . In this paper, contrast the product quality of SiF4 in the domestic and foreign markets and quantitative analysis of impurities in the gas of SiF4 that produce from fluosilieie acid as raw material, including oxygen fluorine , silicon compounds, hydrocarbons, hydrogen fluoride, metal elements and iodine. To offer help of detection SiF4 products that made in Chinese.

关 键 词：四氟化硅 杂质 定量 

分 类 号：TQ127.2[化学工程—无机化工]