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机构地区:[1]长沙理工大学物理与电子科学学院,长沙410114
出 处:《微电子学》2015年第4期425-428,共4页Microelectronics
基 金:国家自然科学基金资助项目(61404011);湖南省自然科学基金资助项目(2015JJ3001);湖南省重点学科建设项目;湖南省高校科技创新团队支持计划资助项目
摘 要:基于MOS管在亚阈值区、线性区和饱和区的不同导电特性,采用TSMC 0.18μm CMOS工艺,设计了一种全MOS结构的电压基准源。为了改进核心电路,通过设计并优化预抑制电路,使整个电路实现了高电源电压抑制比的输出电压。对电路进行仿真,当电源电压大于1.5V时,电路进入正常工作状态;在1.8V电源电压下,-20℃~120℃范围内,温度系数为1.04×10^-5/℃,该电压基准源的输出电压为0.688 V;低频时,电源电压抑制比达到-159.3dB,在1MHz时电源电压抑制比为-66.8dB,功耗小于9.83μW。该电压基准源能应用于高电源电压抑制比、低功耗的LDO电路中。A novel bandgap voltage reference source with all MOSFET structure was designed based on the different characteristics of the MOSFET sub-threshold region,linear region and saturated region. The circuit was implemented in TSMC CMOS 0.18 μm technology. The pre-rejection section of the circuit was designed to achieve a high power supply rejection ratio. With the Spectre simulator of the Cadence, simulation results showed that the proposed circuit could work normally while the supply voltage was more than 1.5 V. The output voltage of the voltage reference source was 0. 688 V, and the temperature coefficient was 1.04 × 10^-5/℃ in the range of -20 ℃ to 120℃ with the power supply voltage of 1.8 V. The circuit exhibited the PSRR of --159.3 dB at low frequency. The PSRR was - 66.8 dB and the power consumption was less than 9.83 μW at 1 MHz. The bandgap voltage reference source was suitable for the high PSRR arid low power LDO.
分 类 号:TN432[电子电信—微电子学与固体电子学]
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